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Journal Articles

Opacity effect on extreme ultraviolet radiation from laser-produced tin plasmas

Fujioka, Shinsuke*; Nishimura, Hiroaki*; Nishihara, Katsunobu*; Sasaki, Akira; Sunahara, Atsushi*; Okuno, Tomoharu*; Ueda, Nobuyoshi*; Ando, Tsuyoshi*; Tao, Y.*; Shimada, Yoshinori*; et al.

Physical Review Letters, 95(23), p.235004_1 - 235004_4, 2005/12

 Times Cited Count:147 Percentile:95.58(Physics, Multidisciplinary)

no abstracts in English

Journal Articles

Approach to optimize conversion efficiency of discharge-pumped plasma extreme ultraviolet sources

Masnavi, M.*; Nakajima, Mitsuo*; Sasaki, Akira; Hotta, Eiki*; Horioka, Kazuhiko*

Applied Physics Letters, 87(11), p.111502_1 - 111502_3, 2005/09

 Times Cited Count:4 Percentile:17.87(Physics, Applied)

no abstracts in English

Journal Articles

Characterization of extreme ultraviolet emission from laser-produced spherical tin plasma generated with multiple laser beams

Shimada, Yoshinori*; Nishimura, Hiroaki*; Nakai, Mitsuo*; Hashimoto, Kazuhisa*; Yamaura, Michiteru*; Tao, Y.*; Shigemori, Keisuke*; Okuno, Tomoharu*; Nishihara, Katsunobu*; Kawamura, Toru*; et al.

Applied Physics Letters, 86(5), p.051501_1 - 051501_3, 2005/01

 Times Cited Count:113 Percentile:94.26(Physics, Applied)

no abstracts in English

Journal Articles

Effect of the satellite lines and opacity on the extreme ultraviolet emission from high-density Xe plasmas

Sasaki, Akira; Nishihara, Katsunobu*; Murakami, Masakatsu*; Koike, Fumihiro*; Kagawa, Takashi*; Nishikawa, Takeshi*; Fujima, Kazumi*; Kawamura, Toru*; Furukawa, Hiroyuki*

Applied Physics Letters, 85(24), p.5857 - 5859, 2004/12

 Times Cited Count:43 Percentile:80.02(Physics, Applied)

no abstracts in English

Journal Articles

Characteristics of extreme ultraviolet radiation conversion efficiency of a xenon plasma

Masnavi, M.*; Nakajima, Mitsuo*; Sasaki, Akira; Hotta, Eiki*; Horioka, Kazuhiko*

Japanese Journal of Applied Physics, 43(12), p.8285 - 8291, 2004/12

 Times Cited Count:5 Percentile:23.97(Physics, Applied)

no abstracts in English

Journal Articles

Laser produced plasma for EUV light source for lithography

Nishihara, Katsunobu*; Nishimura, Hiroaki*; Mochizuki, Takayasu*; Sasaki, Akira

Reza Kenkyu, 32(5), p.330 - 336, 2004/05

no abstracts in English

Journal Articles

Theoretical simulation of extreme UV radiation source for lithography

Fujima, Kazumi*; Nishihara, Katsunobu*; Kawamura, Toru*; Furukawa, Hiroyuki*; Kagawa, Takashi*; Koike, Fumihiro*; More, R.*; Murakami, Masakatsu*; Nishikawa, Takeshi*; Sasaki, Akira; et al.

Emerging Lithographic Technologies VIII, Proceedings of SPIE Vol.5374, p.405 - 412, 2004/00

no abstracts in English

Journal Articles

Theoretical EUV spectrum of near Pd-like Xe

Sasaki, Akira

Purazuma, Kaku Yugo Gakkai-Shi, 79(4), p.315 - 317, 2003/04

no abstracts in English

Journal Articles

Patterning of SnO$$_{2}$$ thin films by combination of lithographic photoirradiation and pyrolysis of an organotin polymer

*; Ichinose, Yuji; Kawanishi, Shunichi; Nishii, Masanobu; Sasuga, Tsuneo; *; *

Chemistry of Materials, 9(12), p.2674 - 2675, 1997/00

 Times Cited Count:18 Percentile:62.45(Chemistry, Physical)

no abstracts in English

Journal Articles

Nonlinear laser intensity dependence of the formation of carboxylic acid groupsat the surface of polymer films; The effect of coupling of radical intermediates

Ichinose, Yuji; *; Kawanishi, Shunichi; *; *

Langmuir, 13(10), p.2603 - 2605, 1997/00

 Times Cited Count:8 Percentile:45.43(Chemistry, Multidisciplinary)

no abstracts in English

Journal Articles

Design of imaging system for EUVL

*; *; Koike, Masato; *

Proc. of SPIE Vol. 3152, 3152, p.211 - 220, 1997/00

no abstracts in English

Oral presentation

Modeling of fragmentation of laser irradiated tin droplet target for extreme ultraviolet (EUV) light sources

Sasaki, Akira

no journal, , 

In the study of extreme ultraviolet (EUV) light sources, high conversion efficiency is achieved using the double pulse technique; a small tin droplet target is irradiated by the prepulse laser to cause fragmentation of the target to form a cloud small particles or mist, which is heated by the main CO$$_2$$ laser pulse to produce the uniform plasma from which efficient EUV emission is obtained. The fragmentation may be caused due to shock heating driven by the prepulse laser irradiation, which also may bring the target to the warm dense state. In this paper, a new hydrodynamics simulation, which will be used to calculate the temporal and spatial development of tin particles, is proposed. The simulation is based on the two dimensional self-adapting Lagrangian grid. The theory of liquid and gas phase transition in thermodynamic equilibrium, allows one to determine the ratio between gas and liquid phase at given temperature and density.

Oral presentation

Hydrodynamics modeling of the dynamics of Sn droplet target for the EUV source

Sasaki, Akira

no journal, , 

Improvement of the efficiency and output power of the EUV source is essential for the realization of the next generation micro-lithography. Recently, a high efficiency is obtained using the double pulse technique, where the Sn droplet is broken up into particles by the irradiation of the relatively weak pre-pulse laser. For the optimization of the source, we study methods for the modeling of pre-plasma formation including the solid/liquid to gas phase transition of Sn and particle emission. We study the equation of state of Sn and phase transition theoretically, and also study methods to calculate distribution of solid/liquid and gas phase after the phase transition. Results of test calculation of the evaporation hot Sn droplet will be shown.

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